Predicting very rare stochastic defects in EUVL processes for full-chip correction and verification

Zachary Adam Levinson; Yudhishthir Kandel; Makoto Miyagi; Kevin Lucas

doi:10.1117/12.2585068

22 February 2021 Predicting very rare stochastic defects in EUVL processes for full-chip correction and verification

Zachary Adam Levinson, Yudhishthir Kandel, Makoto Miyagi, Kevin Lucas

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 1160915 (2021) https://doi.org/10.1117/12.2585068
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

The quality of any lithographic pattern is dependent on the photon absorption events that a photoresist pattern receives during exposure and subsequent molecular events. The failure probability is not governed by the stochastics of any one process and is conditional on multiple stochastic and conventional variations (such as resist thickness). These processes jointly result in the observed distribution with multiple pathways resulting in the same rare event. This paper will examine how probabilistic processes combine to form rare defects so that these defects can be predicted and corrected. Rigorous simulations will be used to study the distributions and will be applied to existing stochastic compact model forms.

Conference Presentation

Citation Download Citation

Zachary Adam Levinson, Yudhishthir Kandel, Makoto Miyagi, and Kevin Lucas "Predicting very rare stochastic defects in EUVL processes for full-chip correction and verification", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 1160915 (22 February 2021); https://doi.org/10.1117/12.2585068

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