Translator Disclaimer
Presentation
22 February 2021 Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains
Author Affiliations +
Abstract
Directed self-assembly (DSA) of block copolymer thin films remains a promising alternative to achieve the resolution gains needed to enable dense patterning with sub-10 nm critical dimensions (CD). Yet, some significant challenges remain. Among others, two challenges stand out: one relating to the thermodynamic and kinetic conditions that lead to finite defect densities while the second relates to a scalability challenge to harness simultaneous gains in both resolution metrics: minimum line width and minimum pitch. Here we present a self-registered self-assembly process that employs a two-step DSA to address both the energetics of defect formation and the scalability limitations to achieve simultaneous gains in both pitch and line width when compared to the guiding patterns.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lei Wan and Ricardo Ruiz "Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100L (22 February 2021); https://doi.org/10.1117/12.2584668
PROCEEDINGS
PRESENTATION


SHARE
Advertisement
Advertisement
Back to Top