Presentation + Paper
22 February 2021 Curvilinear data format working group for MBMW era
Author Affiliations +
Abstract
Multi-beam mask writers (MBMW) offer the potential to enable the use of ideal curvilinear shapes for ILT masks, but current layout formats are not sufficient to represent complex ILT designs efficiently from OPC through mask making. In the 2019 BACUS conference, we proposed the formation of a data format working group to address the need for curvilinear data representation for MBMW. The Curvilinear data format working group was first initiated in October 2019 with participation from EDA companies and advanced mask makers. In this paper, the necessity of a new curvilinear data format and our working group will be introduced. We will discuss the progress and the plan of the working group.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Buck Peter, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, and Nageswara Rao "Curvilinear data format working group for MBMW era", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100S (22 February 2021); https://doi.org/10.1117/12.2587109
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KEYWORDS
Electronic design automation

Mask making

Optical proximity correction

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