Study of further image performance improvement by spectral bandwidth  for ArFi lithography lightsource

Takamitsu Komaki; Shinichi Matsumoto; Koichi Fujii; Takehiko Tomonaga; Taku Yamazaki; Toshihiro Oga

doi:10.1117/12.2583731

22 February 2021 Study of further image performance improvement by spectral bandwidth for ArFi lithography lightsource

Takamitsu Komaki, Shinichi Matsumoto, Koichi Fujii, Takehiko Tomonaga, Taku Yamazaki, Toshihiro Oga

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116112T (2021) https://doi.org/10.1117/12.2583731
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

DUV lightsources used in lithography process is enabling to shrink the feature size as a driver for Moore’s Law in order to make semiconductor devices to a new level. Multi-patterning processes has been applied to break through the ArFi resolution limit. These processes require the pattern fidelity and placement accuracy.We have studied an impact of bandwidth distribution and asymmetry by imaging simulation. The results show the bandwidth shape and asymmetry cause a change in the CD. Our study shows that Gigaphoton‘s latest light source can contribute to improvements of fidelity and EPE.

Conference Presentation

Citation Download Citation

Takamitsu Komaki, Shinichi Matsumoto, Koichi Fujii, Takehiko Tomonaga, Taku Yamazaki, and Toshihiro Oga "Study of further image performance improvement by spectral bandwidth for ArFi lithography lightsource", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116112T (22 February 2021); https://doi.org/10.1117/12.2583731

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