Plasma assisted particle contamination control: plasma charging dependence on particle morphology

J. C. A. van Huijstee; B. van Minderhout; R. M. H. Rompelberg; P. Blom; T. Peijnenburg; J. Beckers

doi:10.1117/12.2584607

22 February 2021 Plasma assisted particle contamination control: plasma charging dependence on particle morphology

J. C. A. van Huijstee, B. van Minderhout, R. M. H. Rompelberg, P. Blom, T. Peijnenburg, J. Beckers

Proceedings Volume 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV; 116113A (2021) https://doi.org/10.1117/12.2584607
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

With the introduction of EUV lithography, the control of contamination in advanced semiconductor processes has become increasingly critical. Our work is a joint effort (TU/e and VDL-ETG) and is aimed at the development of plasma-assisted contamination control strategies mainly focusing on airborne particles in a low pressure gas. We present experiments comparing the charge-to-mass ratio of single spherical micron-sized particles with that of non-spherical agglomerates thereof in the spatial plasma afterglow. It is shown that the charge-to-mass ratio of two-particle clusters deviates only 6% from that of singlets. This means that for the proposed mitigation strategy, of which the efficiency is based on the charge-to-mass ratio, it is acceptable to study the charging of spherical particles and to extrapolate the results towards non-spherical particles within a reasonable range.

Citation Download Citation

J. C. A. van Huijstee, B. van Minderhout, R. M. H. Rompelberg, P. Blom, T. Peijnenburg, and J. Beckers "Plasma assisted particle contamination control: plasma charging dependence on particle morphology", Proc. SPIE 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 116113A (22 February 2021); https://doi.org/10.1117/12.2584607

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available