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5 March 2021 Non-paraxial diffractive optical elements for beam-splitting with ultra-high uniformity
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Conference Poster
Abstract
Laser applications like 3D sensing, multifocal microscopy and material processing require high uniformity of the dot patterns created by diffractive optical elements (DOEs). Using an inverse design method for such DOEs, based on gradient-optimization and rigorous coupled-wave analysis, we have investigated a few case studies. We will discuss beam splitters generating a 1D 1×15 fan-out for 1550 nm wavelength, a 1D 1×16 fan-out for 532 nm wavelength and a 2D 3×5 fan-out for 405 nm wavelength with full-pattern angles up to 54°. We obtained uniformity errors as low as 3% for the elements fabricated in fused silica.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pavel Dyachenko, Andre Wiss, and Andreas Hermerschmidt "Non-paraxial diffractive optical elements for beam-splitting with ultra-high uniformity", Proc. SPIE 11672, Laser Resonators, Microresonators, and Beam Control XXIII, 1167212 (5 March 2021); https://doi.org/10.1117/12.2576889
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