An Ion Figuring System For Large Optic Fabrication

Lynn N. Allen; Robert E. Keim

doi:10.1117/12.962968

22 December 1989 An Ion Figuring System For Large Optic Fabrication

Lynn N. Allen, Robert E. Keim

Proceedings Volume 1168, Current Developments in Optical Engineering and Commercial Optics; (1989) https://doi.org/10.1117/12.962968
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Ion figuring has recently been shown to be an efficient and deterministic optical fabrication method. Eastman Kodak Company has developea a five-axis, computer-controlled Ion Figuring System (IFS) for final figuring of large size optical elements. Components with major dimensions up to 2.5 x 2.5 x 0.6m can be processed. A standard Kaufman-type, ,broad-beam ion source has been employed to supply the stable ion beam removal function, used to physically sputter desired material from the target optical surface. Modeling results of this process have shown great potential to rapidly converge to required optical surface figures.

Citation Download Citation

Lynn N. Allen and Robert E. Keim "An Ion Figuring System For Large Optic Fabrication", Proc. SPIE 1168, Current Developments in Optical Engineering and Commercial Optics, (22 December 1989); https://doi.org/10.1117/12.962968

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