Exploring AlGaN nanostructures fabricated via chemical wet etching

Barbara A. Kazanowska; Keshab R. Sapkota; Brendan P. Gunning; Kevin S. Jones; George T. Wang

doi:10.1117/12.2582551

6 March 2021 Exploring AlGaN nanostructures fabricated via chemical wet etching

Barbara A. Kazanowska, Keshab R. Sapkota, Brendan P. Gunning, Kevin S. Jones, George T. Wang

Proceedings Volume 11686, Gallium Nitride Materials and Devices XVI; 1168625 (2021) https://doi.org/10.1117/12.2582551
Event: SPIE OPTO, 2021, Online Only

Abstract

AlGaN is a leading candidate for current and future ultra-wide bandgap electronic and optoelectronic applications. However, 3D etch technologies for AlGaInN remain immature compared to silicon, limiting its full potential for novel devices. Here, we build from the foundation of anisotropic KOH-based wet etchants used to fabricate GaN structures and explore AlGaN alloys etched in acids and bases. We investigate the etch reactivity of AlGaN alloys as a function of Al content in various etchants. We then explore the etch evolution of novel nanostructures observed and discuss possible mechanistic explanations. Lastly, we look at field emission properties of AlGaN alloys.

Conference Presentation

Citation Download Citation

Barbara A. Kazanowska, Keshab R. Sapkota, Brendan P. Gunning, Kevin S. Jones, and George T. Wang "Exploring AlGaN nanostructures fabricated via chemical wet etching", Proc. SPIE 11686, Gallium Nitride Materials and Devices XVI, 1168625 (6 March 2021); https://doi.org/10.1117/12.2582551

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