Presentation + Paper
5 March 2021 Random anti-reflection subwavelength surface structures on deterministic illumination diffusers
Author Affiliations +
Abstract
Deterministic illumination diffractive-diffusers have non-periodic short and medium scale topography. Because of the quasi-randomized locations and vertical sidewalls at phase transition boundaries, over-coating diffractive diffusers with thin film antireflection layers perturbs their function, resulting in illumination performance deviations and nonuniformities. To mitigate these effects, we added anti-reflection random nano-structures (rARSS) on the surface of three different classes of fused-silica multi-phase diffractive diffusers, using reactive-ion plasma etching. The diffusers were measured before and after the random nanostructure addition, using a polarized-laser scatterometer with a dynamic range of nine orders-of-magnitude. The bi-directional scatter distribution function (BSDF) was measured over the entire equatorial plane of incidence, to analyze the directionality of scattered light, and the impact of the rARSS on the optical performance of the diffusers. An overall Fresnel reflectivity suppression was measured in the directional illumination patterns, as well as, across the entire 180° angle-sweep. The designed deterministic illumination distribution patterns and contrast were unaffected by the presence of the rARSS.
Conference Presentation
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Praneeth Gadamsetti, Karteek Kunala, and Menelaos K. Poutous "Random anti-reflection subwavelength surface structures on deterministic illumination diffusers", Proc. SPIE 11694, Photonic and Phononic Properties of Engineered Nanostructures XI, 1169416 (5 March 2021); https://doi.org/10.1117/12.2577040
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KEYWORDS
Diffusers

Antireflective coatings

Light scattering

Nanostructures

Plasma etching

Reflectivity

Thin films

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