Presentation + Paper
12 April 2021 Thick Al0.85Ga0.15As0.56Sb0.44 avalanche photodiodes on InP substrate
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Abstract
We present gain, dark current and excess noise characteristics of PIN Al0.85Ga0.15As0.56Sb0.44 (hereafter AlGaAsSb) avalanche photodiodes (APDs) on InP substrates with 1000 nm thick multiplier layers. The AlGaAsSb APDs were grown by molecular beam epitaxy using a digital alloy technique (DA) to avoid phase separation. Current-voltage measurements give a peak gain of ~ 42, a breakdown voltage of – 54.3 V, and a dark current density at a gain of 10 of ~ 145 μA/cm2. Excess noise measurements of multiple AlGaAsSb APDs show that k (the ratio of electron and hole impact ionization coefficients) is ~ 0.01. This k-value is comparable to Si, which is widely used for visible and near-infrared APDs. The low dark current density and low excess noise suggest that such thick AlGaAsSb layers are promising multipliers in separate absorption, charge and multiplication (SACM) structures for short-wavelength infrared applications such as optical communication and LIDAR, particularly on a commercial InP platform.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seunghyun Lee, Sri Harsha Kodati, Bingtian Guo, Andrew H. Jones, Mariah Schwartz, Hyemin Jung, Nicole Pfiester, Martin Winslow, Christopher H. Grein, Theodore J. Ronningen, Joe C. Campbell, and Sanjay Krishna "Thick Al0.85Ga0.15As0.56Sb0.44 avalanche photodiodes on InP substrate", Proc. SPIE 11741, Infrared Technology and Applications XLVII, 117410B (12 April 2021); https://doi.org/10.1117/12.2585831
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