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18 April 2021 Monolithic active-passive photonic integration
Sonia M. García-Blanco, Ivo Hegeman, Jinfeng Mu, Carlijn M. I. van Emmerik, Carlos E. Osornio Martinez, Meindert Dijkstra
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Proceedings Volume 11775, Integrated Optics: Design, Devices, Systems and Applications VI; 117750A (2021) https://doi.org/10.1117/12.2589271
Event: SPIE Optics + Optoelectronics, 2021, Online Only
Abstract
The monolithic integration of active materials providing optical gain and optical non-linearities is instrumental to increase the functionality of integrated photonic circuits. A double layer integration scheme has been experimentally demonstrated, exhibiting transition losses between the two materials of less than 0.2 dB. Furthermore, a single layer integration scheme is proposed, which decreases the number of process steps, reducing fabrication cost, and also decreasing the sensitivity to fabrication tolerances. In this paper, we will overview our recent developments on the monolithic integration of both, Al2O3 and TiO2 onto the passive Si3N4 and Al2O3 platforms for the development of on-chip amplifiers and lasers.
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Sonia M. García-Blanco, Ivo Hegeman, Jinfeng Mu, Carlijn M. I. van Emmerik, Carlos E. Osornio Martinez, and Meindert Dijkstra "Monolithic active-passive photonic integration", Proc. SPIE 11775, Integrated Optics: Design, Devices, Systems and Applications VI, 117750A (18 April 2021); https://doi.org/10.1117/12.2589271
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KEYWORDS
Active optics
Integrated optics
Integrated circuit design
Integrated circuits
Integrated photonics
Optical amplifiers
Photonic integrated circuits
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