Paper
30 January 1990 Continuum Modeling Of rf Glow Discharges
Herbert H. Sawin, Evangelos Gogolides
Author Affiliations +
Proceedings Volume 1185, Dry Processing for Submicrometer Lithography; (1990) https://doi.org/10.1117/12.978060
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States
Abstract
The electrodynamics of rf glow discharges has been described by a continuum model that simulates the creation, loss, energy gain and loss, and transport of charged particles within the discharge. Detailed comparisons between the model predictions and experimental measurements have been made to test the model; e.g., the spatially and temporally resolved emission of SF6 and Ar discharges. The model which uses no adjustable parameters, has been shown to be in good agreement with all measures to date. In previous continuum models', an initial guess is made for the concentration and energy of the charged species and then the set of differential equations are integrated until the oscillatory steady state is reached. We have developed a mathematical algorithm which solves directly for the oscillatory steady-state, avoiding the time integration and typically reducing the computation time by several orders of magnitude.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Herbert H. Sawin and Evangelos Gogolides "Continuum Modeling Of rf Glow Discharges", Proc. SPIE 1185, Dry Processing for Submicrometer Lithography, (30 January 1990); https://doi.org/10.1117/12.978060
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KEYWORDS
Ions

Argon

Ionization

Plasma

Electrodes

Autoregressive models

Lithography

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