Demonstration of proof of concept of the EUV-FEL for future lithography

Norio Nakamura; Ryokou Kato; Hiroshi Sakai; Kimichika Tsuchiya; Yasunori Tanimoto; Yosuke Honda; Tsukasa Miyajima; Miho Shimada; Takashi Obina; Hiroshi Kawata

doi:10.1117/12.2600782

30 September 2021 Demonstration of proof of concept of the EUV-FEL for future lithography

Norio Nakamura, Ryokou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, Hiroshi Kawata

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540M (2021) https://doi.org/10.1117/12.2600782
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

An ERL(energy recovery linac)-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic noise and to achieve higher throughput. An IR-FEL project started at the KEK cERL for the purpose of developing high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. We will briefly review the EUV-FEL and present construction and commissioning of the cERL IR-FEL including future work.

Conference Presentation

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Norio Nakamura, Ryokou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, and Hiroshi Kawata "Demonstration of proof of concept of the EUV-FEL for future lithography", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540M (30 September 2021); https://doi.org/10.1117/12.2600782

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