In-Situ Cluster Processing For Advanced Semiconductor Technologies

Edward Matuszak; Craig Hill; David Horak

doi:10.1117/12.963943

15 February 1990 In-Situ Cluster Processing For Advanced Semiconductor Technologies

Edward Matuszak, Craig Hill, David Horak

Proceedings Volume 1188, Multichamber and In-Situ Processing of Electronic Materials; (1990) https://doi.org/10.1117/12.963943
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

Each generation of VLSI semiconductor technology is more complex than the previous generation. Therefore, to help minimize manufacturing costs, turnaround time and defect levels, process clustering has become an attractive alternative to traditional, nonclustering processing. A unique application to cluster processing is in-situ cluster processing, defined as multiprocess steps using various chambers under vacuum inside a single machine. The use of four single wafer reactors (SWR) combined with a common load-lock capable of deposition and etch processes was examined for spacer processes. Two examples will be discussed in some detail: spacer formation and recess/collar formation.

Citation Download Citation

Edward Matuszak, Craig Hill, and David Horak "In-Situ Cluster Processing For Advanced Semiconductor Technologies", Proc. SPIE 1188, Multichamber and In-Situ Processing of Electronic Materials, (15 February 1990); https://doi.org/10.1117/12.963943

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