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Following customer demand, silicon oxynitride optical coatings were produced by ion beam sputtering (IBS). The multilayer sequence of the samples was designed such that the low refractive index was provided by SiO2, whereas for different designs a different composition of silicon oxynitride (n≈1.5–1.9) was used as high refractive material. This was realized by varying the ratio of the reactive gas components N2 and O2. LIDT measurements were carried out using a pulsed laser (9ns FWHM) @1064nm. Additionally, comparative measurements were carried out with frequency doubled pulses at 532nm. The performances of the designs were compared with their oxide-based QWOT-equivalents.
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Sina Malobabic, Niklas Höpfl, Sebastian Herr, Lars Mechold, "LIDT investigations on Ion Beam Sputtered silicon oxynitride coatings," Proc. SPIE 11910, Laser-Induced Damage in Optical Materials 2021, 119100Z (12 October 2021); https://doi.org/10.1117/12.2598552