Paper
9 August 2021 Research on the properties of HfO2 optical films prepared with APS assisted electron beam evaporation deposition
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Proceedings Volume 11912, Pacific Rim Laser Damage 2021: Optical Materials for High-Power Lasers; 1191207 (2021) https://doi.org/10.1117/12.2602069
Event: Pacific Rim Laser Damage 2021: Optical Materials for High Power Lasers, 2021, Hangzhou, China
Abstract
HfO2 thin films are widely used in laser system because of its superior optical and mechanical properties, especially high laser induced damage threshold. In this paper, single-layer HfO2 thin films were prepared by APS plasma assisted electron beam evaporation deposition. The effects of oxygen charging of electron gun, baking temperature, discharge current of APS source and bias voltage of APS source on optical properties, surface roughness, standing wave electric filed and laser induced damage threshold of HfO2 thin films were studied by orthogonal experiment. Experiment and analysis results showed that the characteristics of HfO2 thin films are closely related to the oxygen charging of electron gun, baking temperature and APS assisted processing parameters. Especially, baking temperature, oxygen charging of electron gun and bias voltage of APS source have great influence on laser induced damage threshold. Through the analysis of experimental date, the optimal combination of process parameters for APS assisted electron beam evaporation of HfO2 optical films were obtained.
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Yong-gang Pan, Zheng Liu, Mian Li, Wen-cheng Liu, Long Bai, Si-bao Zhang, Chang-xin Luo, and Chun-juan Zhang "Research on the properties of HfO2 optical films prepared with APS assisted electron beam evaporation deposition", Proc. SPIE 11912, Pacific Rim Laser Damage 2021: Optical Materials for High-Power Lasers, 1191207 (9 August 2021); https://doi.org/10.1117/12.2602069
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