Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry

Yasuhiro Hidaka; Jinyong Kim; Jaehwang Jung; Mitsunori Numata; Wookrae Kim; Shinji Ueyama; Myungjun Lee

doi:10.1117/12.2614734

26 May 2022 Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry

Yasuhiro Hidaka, Jinyong Kim, Jaehwang Jung, Mitsunori Numata, Wookrae Kim, Shinji Ueyama, Myungjun Lee

Author Affiliations +

Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 1205311 (2022) https://doi.org/10.1117/12.2614734
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

A recently introduced novel concept ellipsometry, characterized by its unique derivation process of directly extracting the polarization information from the hologram image on pupil plane, has been evaluated experimentally targeting for the application to OCD and overlay tools. With an improvement of splitting the hologram on the pupil, this self-interferometric pupil ellipsometry (SIPE) has gained the capability of measuring all of Stokes parameters (S0-S3) throughout the incident angle of 0 to 72 degrees with omnidirectional orientation. A prototype system incorporating SIPE technology has been fabricated to conduct the performance test with patterned test samples for overlay and CD evaluation, the result of which exhibits the sufficient sensitivity to dimension variation and superior repeatability for practical use. The measurement of thousands of ellipsometric data on pupil only takes tens of milliseconds at the most, realized by leveraging the advantages of self-interferometry that does not have any rotating elements in optics. The experimental result demonstrates the consistency with the simulation results based on TEM data within entire pupil. In the front-line of advanced semiconductor manufacturing, the main obstacles to OCD application, low sensitivity and parameter coupling, have been evaluated, which indicates good prospects with SIPE technology.

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Citation Download Citation

Yasuhiro Hidaka, Jinyong Kim, Jaehwang Jung, Mitsunori Numata, Wookrae Kim, Shinji Ueyama, and Myungjun Lee "Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205311 (26 May 2022); https://doi.org/10.1117/12.2614734

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