Understanding contributors to critical dimension uniformity (CDU) is becoming ever more important. We propose a systematic CDU breakdown into contributions that can be attributed to local CDU, intra-field CDU, field-to-field CDU, intra-lot CDU and lot-to-lot CD variations using smart metric definitions. We checked the CDU breakdown on synthetic data as well as on real DRAM production data. Comparing our CDU breakdown to results from nested ANOVA made with statistical software packages, we could verify that the results were very close, while our calculation method was orders of magnitude faster.
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