Development of an injection-controlled high-power XeF(C->A) excimer laser

Shigeru Yamaguchi; Thomas Hofmann; C. Brent Dane; Roland A. Sauerbrey; William L. Wilson; Frank K. Tittel

doi:10.1117/12.18475

1 June 1990 Development of an injection-controlled high-power XeF(C→A) excimer laser

Shigeru Yamaguchi, Thomas Hofmann, C. Brent Dane, Roland A. Sauerbrey, William L. Wilson, Frank K. Tittel

Proceedings Volume 1225, High-Power Gas Lasers; (1990) https://doi.org/10.1117/12.18475
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

The performance of a scaled, repetitively pulsed injection controlled XeF (C-A) laser system is reported. A 1 Hz electron beam pumped XeF (C-A) laser system produced 0.8 J per pulse with an intrinsic efficiency of 1.5 percent. Details of a compact halogen compatible flow loop is reported. Various unstable resonator geometries were evaluated. A minimum beam divergence of 150 microrad (full angle) corresponding to a three times diffraction-limited beam was determined from far field measurements.

Citation Download Citation

Shigeru Yamaguchi, Thomas Hofmann, C. Brent Dane, Roland A. Sauerbrey, William L. Wilson, and Frank K. Tittel "Development of an injection-controlled high-power XeF(C→A) excimer laser", Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); https://doi.org/10.1117/12.18475

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