Long-pulse (5 us) e-beam pumped XeF laser

Michael C. Cates

doi:10.1117/12.18471

1 June 1990 Long-pulse (5 μs) e-beam pumped XeF laser

Michael C. Cates

Proceedings Volume 1225, High-Power Gas Lasers; (1990) https://doi.org/10.1117/12.18471
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

A 5 microsec e-beam pumped XeF laser is described. Low concentrations of xenon and fluorine donor (NF3 or F2) were required to reduce losses for long-pulse operation at low (27 kW/cc) pump rates. Better performance was obtained using NF3 as the fluorine donor. The intrinsic efficiency was found to be flat over the laser pulse length, and averaged 1.1 percent. The laser output consisted of only the 353 nm line. A Rigrod treatment yielded a net gain 0.5 percent/cm.

Citation Download Citation

Michael C. Cates "Long-pulse (5 μs) e-beam pumped XeF laser", Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); https://doi.org/10.1117/12.18471

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