10th Annual eBeam Initiative Survey Reports Photomask Market Optimism

Aki Fujimura; Jan Willis

doi:10.1117/12.2640370

15 September 2022 10th Annual eBeam Initiative Survey Reports Photomask Market Optimism

Aki Fujimura, Jan Willis

Author Affiliations +

Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250G (2022) https://doi.org/10.1117/12.2640370
Event: Photomask Japan 2022, 2022, Online Only

Abstract

The eBeam Initiative completed its 10th annual opinion survey in July 2021 with anonymous feedback from industry luminaries representing 44 companies from across the semiconductor ecosystem – including photomasks, electronic design automation (EDA), chip design, equipment, materials, manufacturing and research. Started in 2012, the Luminaries survey is used each year to gather predictions of industry trends. The optimism for overall photomask market growth captured in the 2020 survey continued to increase in the 2021 survey. 72 percent of survey respondents predict that mask revenues in 2021 will increase compared to 2020 revenues, while 74 percent believe that EUV will contribute to mask revenue growth. EUV also remains the top reason cited by respondents for purchasing multi-beam mask writers. 90 percent of respondents believe that purchases of multi-beam mask writers will grow over the next three years, while purchasing sentiment for laser mask writers and variable shaped beam (VSB) eBeam mask writers has increased compared to last year’s survey. Confidence in curvilinear mask making is also high according to a new survey question, with 71 percent indicating that leading-edge mask shops can handle at least a limited number of such masks. Taken together, the survey results reflect optimism for both business growth and technology adoption in the photomask market.

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Aki Fujimura and Jan Willis "10th Annual eBeam Initiative Survey Reports Photomask Market Optimism", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250G (15 September 2022); https://doi.org/10.1117/12.2640370

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KEYWORDS

Photomasks

Extreme ultraviolet

Inspection

Pellicles

High volume manufacturing

Semiconducting wafers

Manufacturing

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