Design rule manual and DRC code qualification flows empowered by high coverage synthetic layouts generation

Aliaa Kabeel; Sutae Kim; Young Gook Park; Donggyun Kim; Joe Kwan; Sarah Rizk; Kareem Madkour; Marwa Shafee; Jinhee Kim

doi:10.1117/12.2658350

28 April 2023 Design rule manual and DRC code qualification flows empowered by high coverage synthetic layouts generation

Aliaa Kabeel, Sutae Kim, Young Gook Park, Donggyun Kim, Joe Kwan, Sarah Rizk, Kareem Madkour, Marwa Shafee, Jinhee Kim

Author Affiliations +

Proceedings Volume 12495, DTCO and Computational Patterning II; 124951T (2023) https://doi.org/10.1117/12.2658350
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

The Design Rule Manual (DRM) is a critical component in the introduction and release of new technology nodes. It is the reference manual of definitive requirements, documented in detail, on all information regarding design rules and technology node design requirements. The DRM is a contract between the foundry and the designer. Designs must meet all documented requirements to be accepted for manufacture. The DRM’s critical role in process design enablement obligates it to a very high quality standard. The DRM must be accurate, reliable, and clear of ambiguity. Qualification of the DRM is crucial as design rules become extremely complex with advancing technology. DRM teams must ensure all descriptions and figures are correct and clear versus target requirements from the beginning of the technology development stage. The qualification process should cover all typical cases as well as corner and unexpected cases. Traditional methods of targeted pattern creation leave gaps in ensuring a high quality DRM. Those methods often miss complex scenarios leading to incomplete DRM documentation or descriptions with vague ambiguity. Ambiguity in the DRM leads to improper DRC rule coding, resulting in erroneous DRC checking. This paper presents a synthetic pattern/layout generation approach to high quality and high coverage DRM and DRC qualification. The generated patterns flow into a post-generation-analysis-fix step that helps discover and analyze issues while initial design rules and DRC code is being developed. Guided random generation of legal layout patterns produces simple and complex pattern configurations to challenge the accuracy and consistency between the original intention of the complex design rules and DRC rule deck. The post-generation-analysis-fix step helps identify locations of potential discrepancy. Flushing out these discrepancies and ambiguities drives enhancements to converge on robust DRM documentation and consistency between design rule intent and DRC run set implementation from early development throughout the life cycle of process node deployment.

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Aliaa Kabeel, Sutae Kim, Young Gook Park, Donggyun Kim, Joe Kwan, Sarah Rizk, Kareem Madkour, Marwa Shafee, and Jinhee Kim "Design rule manual and DRC code qualification flows empowered by high coverage synthetic layouts generation", Proc. SPIE 12495, DTCO and Computational Patterning II, 124951T (28 April 2023); https://doi.org/10.1117/12.2658350

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