Replication of 3D patterns from a grayscale resist master by nanoimprint process

Api Warsono; Diana Fernandez Rodas; Jérôme Rêche; Anaïs De Lehelle d'Affroux; Sébastien Berard Bergery

doi:10.1117/12.2658384

30 April 2023 Replication of 3D patterns from a grayscale resist master by nanoimprint process

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle d'Affroux, Sébastien Berard Bergery

Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970A (2023) https://doi.org/10.1117/12.2658384
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

First, Grayscale I-Line lithography process developed in CEA-Leti allows to manufacture a variety of 3D patterns based on the well-known photolithography technology. Grayscale photolithography is an innovative and alternative approach to create 3D patterns such as microlenses for example. Exposure of a low contrast resist at different doses results in different thicknesses in the resist film. The variation of the intrinsic dose is obtained by using a binary mask that has different chromium densities, thus modulating the exposure intensity on the resist surface¹. Secondly, the NanoImprint Lithography (NIL) is a technology capable of reproducing a wide morphological range. NIL is increasingly requested for the reproduction of 3D patterns. Initially, standard NIL process uses a hard master usually composed of Si or SiO₂. The proposed work validates the quality of the replication by the NanoImprint process of a "resist master" created by grayscale lithography. This approach facilitates the manufacturing process of a master by avoiding the etching step and offering a cost-effective solution. The measurement of several types of 3D patterns are performed before and after replication during this study. CD preservation is evaluated for 32 types of microlenses simultaneously replicated. Finally, the combination of the Grayscale and NanoImprint technologies allows to considerably increasing the printing possibilities. By freeing the difficulties of multiple patterns morphology conservation during the etching, the replication of a resist master permits other potential applications, particularly in the optical field.

Conference Presentation

Citation Download Citation

Api Warsono, Diana Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle d'Affroux, and Sébastien Berard Bergery "Replication of 3D patterns from a grayscale resist master by nanoimprint process", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970A (30 April 2023); https://doi.org/10.1117/12.2658384

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