As technology nodes continue to scale down, the full ecosystem around Extreme Ultraviolet Lithography (EUVL) is becoming more mature and proactive in the anticipation of upcoming challenges. To keep up with the technology roadmap evolution, lithography track performance capabilities have also been rapidly expanding through the years and new modules are being specially designed to support the lithographic performance improvement of different materials. In this work, we showcase the capability of novel hardware solutions currently available on SCREEN’s DT-3000 coat-develop track system. Based on a holistic approach, we demonstrate how hardware development is still a key not only to improve process stability and drive down defectivity to historically low levels but also to boost other metrics such as line width roughness (LWR), defect-free process window, and pattern shape.
|