Differential deposition applied to x-ray mirror substrates

Patrice Bras; Sylvain Labouré; Amparo Vivo; François Perrin; Christian Morawe

doi:10.1117/12.2665823

7 June 2023 Differential deposition applied to x-ray mirror substrates

Patrice Bras, Sylvain Labouré, Amparo Vivo, François Perrin, Christian Morawe

Author Affiliations +

Proceedings Volume 12576, EUV and X-ray Optics: Synergy between Laboratory and Space VIII; 1257607 (2023) https://doi.org/10.1117/12.2665823
Event: SPIE Optics + Optoelectronics, 2023, Prague, Czech Republic

Abstract

The process of differential deposition is currently applied at the ESRF in order to correct figure errors of x-ray optics substrates, prior to multilayer deposition. The substrate is moved at a controlled speed in front of a sputtering source to precisely control the deposition profile. This work will describe the concept of differential deposition at the ESRF as well as recent results of its implementation to correct a real mirror substrate surface. Finally, initial studies using a synchrotron beamline characterization technique based on x-ray total reflection are presented.

Conference Presentation

Citation Download Citation

Patrice Bras, Sylvain Labouré, Amparo Vivo, François Perrin, and Christian Morawe "Differential deposition applied to x-ray mirror substrates", Proc. SPIE 12576, EUV and X-ray Optics: Synergy between Laboratory and Space VIII, 1257607 (7 June 2023); https://doi.org/10.1117/12.2665823

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