Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development

Alexei L. Bogdanov; V. A. Nikitaev; Andrey B. Poljakov; V. E. Tukish; Kamil A. Valiev; Leonid V. Velikov; D. Yu. Zaroslov

doi:10.1117/12.20138

1 June 1990 Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development

Alexei L. Bogdanov, V. A. Nikitaev, Andrey B. Poljakov, V. E. Tukish, Kamil A. Valiev, Leonid V. Velikov, D. Yu. Zaroslov

Author Affiliations +

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20138
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

A new resist composition based on PMMA-MAA copolymer with antracene additive was exposed by a single pulse of KrFexcimer laser (X =248 nm). Its contrast was found to exceed significantly the limit determined by light absorbtion. Studies of the development kinetics of the resist and corresponding theoretical reasoning justify the assumption of a thermal activated process (boiling of the residual dissolver).

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Alexei L. Bogdanov, V. A. Nikitaev, Andrey B. Poljakov, V. E. Tukish, Kamil A. Valiev, Leonid V. Velikov, and D. Yu. Zaroslov "Image formation mechanism in PMMA-MAA antracene positive photoresist exposed by pulsed laser and kinetics of its development", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20138

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