Microlithography using conducting polymers

Joachim Bargon; Theo Weidenbrueck; Takumi Ueno

doi:10.1117/12.20109

1 June 1990 Microlithography using conducting polymers

Joachim Bargon, Theo Weidenbrueck, Takumi Ueno

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20109
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Lithographically structured electrically conducting polymers can be otained via photoexposure of precomposites, consisting of a matrix polymer and a photosensitive oxidant. Upon the selective destruction of the oxidant, the remaining oxidant can be used to convert a suitable monomer from its vapor phase into a lithographically patterned, electrically conducting polymer. This two-dimensional pattern can be converted into a three-dimensional pattern either via selective RIE or via electroplating a metal or other conducting material on top of the above composite. In a typical example the matrix polymer is PVC, pyrrole saves as the monomer, FeC13 as the photosensitive oxidant and copper is being electroplated onto the polypyrrole pattern.

Citation Download Citation

Joachim Bargon, Theo Weidenbrueck, and Takumi Ueno "Microlithography using conducting polymers", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20109

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