Negative tone aqueous developable resist for photon, electron, and x-ray lithography

Will Conley; Wayne M. Moreau; Stanley Perreault; Gary T. Spinillo; Robert L. Wood; Jeffrey D. Gelorme; Ronald M. Martino

doi:10.1117/12.20087

1 June 1990 Negative tone aqueous developable resist for photon, electron, and x-ray lithography

Will Conley, Wayne M. Moreau, Stanley Perreault, Gary T. Spinillo, Robert L. Wood, Jeffrey D. Gelorme, Ronald M. Martino

Author Affiliations +

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20087
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The use of negative acting photoresists has become a integral part of device fabrication strategy. In this paper we will. discuss a phenolic based photoresist which incorporates a crosslinkable resin and an acid generating sensitizer. When exposed and thermally treated, the resist forms a negative tone image which is developable in an alkaline medium. We will discuss the materials, processes and results from photon, electron and X-ray lithographic evaluations.

Citation Download Citation

Will Conley, Wayne M. Moreau, Stanley Perreault, Gary T. Spinillo, Robert L. Wood, Jeffrey D. Gelorme, and Ronald M. Martino "Negative tone aqueous developable resist for photon, electron, and x-ray lithography", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20087

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