Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ

Kenji Honda; Bernard T. Beauchemin Jr.; Rodney J. Hurditch; Andrew J. Blakeney; Yasumasa Kawabe; Tadayoshi Kokubo

doi:10.1117/12.20104

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1 June 1990 Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ

Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, Yasumasa Kawabe, Tadayoshi Kokubo

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Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20104
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

effects in the development process. A comprehensive theory ofdissolution inhibition in novolak-DNQ (diazonaphthoquinone) resist is proposed, which is based on experimental studies of novolak-PAC (photoactive compound) interactions and the relationship between novolak microstructres and dissolution inhibition. The theory invokes a "two-step mechanism". Static molecular interactions between novolak and DNQ are augmented by secondary dynamic

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Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, Yasumasa Kawabe, and Tadayoshi Kokubo "Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20104

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