Microcircuit lithography using holographic imaging

Ray T. Chen; Tin M. Aye; Lev S. Sadovnik; David G. Pelka; Tomasz P. Jannson

doi:10.1117/12.20199

1 June 1990 Microcircuit lithography using holographic imaging

Ray T. Chen, Tin M. Aye, Lev S. Sadovnik, David G. Pelka, Tomasz P. Jannson

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20199
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

TLR holograms have been used to generate 0. 5 jim resolution images with illumination by an Argon laser operating at 457 nm. The contact (proximity) printing geometry compatible with standard wafer processing was used for the recording and reconstruction processes. In order to eliminate the expensive and bulky construction involving a prism a backside holographic wave coupler is proposed. 1.

Citation Download Citation

Ray T. Chen, Tin M. Aye, Lev S. Sadovnik, David G. Pelka, and Tomasz P. Jannson "Microcircuit lithography using holographic imaging", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20199

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available