Jue Wang,1 Gerald P. Cox,1 Keith J. Donohue,1 Ronald W. Davis,1 Ying Shi,1 Cody V. Cushman,1 Aram Rezikyan,1 Galan G. Moore,1 James E. Tingley,1 Keith J. Becken,1 Matthew Rosshttps://orcid.org/0000-0002-0434-544X,1 Michael D. Thomas2
1Corning Incorporated (United States) 2Spica Technologies, Inc. (United States)
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Laser-induced damage (LID) tests were conducted on CaF2 optics at 193 nm using ISO S-on-1 method with the S varying from a standard 200 to 103, 104, and 105 shots/site and fluences ranging from 0.1 J/cm2 to 4.0 J/cm2. Using a flat-top beam profile and a beam footprint of 250 μm × 250 μm, absorption-derived LID was observed on the standard 200-on-1 test. Defect-initiated LID was detected by increasing the pulse count with a reduced fluence. The absorption-driven LID was attribute to subsurface damage and two-photon absorption. The former was eliminated by using a FemtoFinish polishing process. The latter was experimentally determined by using laser calorimetric measurement. Improved crystal bulk and surface finishing quality were confirmed by X-ray diffraction and laser calorimetric measurement. Accelerated lifetime damage test (ALDT) was further conducted with an increased pulse count up to 106 shots/site. The results confirm an enhanced lifespan prediction of the demanding laser optics.
Conference Presentation
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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Jue Wang, Gerald P. Cox, Keith J. Donohue, Ronald W. Davis, Ying Shi, Cody V. Cushman, Aram Rezikyan, Galan G. Moore, James E. Tingley, Keith J. Becken, Matthew Ross, Michael D. Thomas, "Laser-induced damage of CaF2 optics at 193 nm," Proc. SPIE 12726, Laser-Induced Damage in Optical Materials 2023, 127260G (24 November 2023); https://doi.org/10.1117/12.2685720