Plasma- and ion-assisted PVD technologies for the production of hard optical coatings

Hans K. Pulker

doi:10.1117/12.20520

1 August 1990 Plasma- and ion-assisted PVD technologies for the production of hard optical coatings

Hans K. Pulker

Proceedings Volume 1275, Hard Materials in Optics; (1990) https://doi.org/10.1117/12.20520
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

High quality dielectric films are required today for various interference optical applications and for planar wave guides in integrated optics. Many inorganic chemical compounds which were difficult to deposit by conventional techniques in form of well adherent, dense, hard and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating materials atom processes. A survey over such PVD coating technologies and on the resulting film properties is given in this paper.

Citation Download Citation

Hans K. Pulker "Plasma- and ion-assisted PVD technologies for the production of hard optical coatings", Proc. SPIE 1275, Hard Materials in Optics, (1 August 1990); https://doi.org/10.1117/12.20520

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