Paper
17 August 2023 Elliptical polarization characterization of scattered light in dark field defect inspection technology
Fengyou Wu, Shuang Xu, Chao Liu
Author Affiliations +
Proceedings Volume 12757, 3rd International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2023); 127570D (2023) https://doi.org/10.1117/12.2690184
Event: 3rd International Conference on Laser, Optics and Optoelectronic Technology (LOPET 2023), 2023, Kunming, China
Abstract
In the field of unpatterned wafer inspection, the biggest market share is dark field defect inspection, in which the signalto-noise ratio limits the detection limit. In order to improve the signal-to-noise ratio of the optical detection method based on the theory of dark-field scattered light. In this paper, the influence of the polarization characteristic of light on the scattering field is studied, and the signal-to-noise ratio of the scattering signal can be improved by controlling the polarization component of light. The results show that modulating the polarized light can achieve a higher signal-to-noise ratio.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fengyou Wu, Shuang Xu, and Chao Liu "Elliptical polarization characterization of scattered light in dark field defect inspection technology", Proc. SPIE 12757, 3rd International Conference on Laser, Optics, and Optoelectronic Technology (LOPET 2023), 127570D (17 August 2023); https://doi.org/10.1117/12.2690184
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KEYWORDS
Air contamination

Polarization

Particles

Scattered light

Light scattering

Polarized light

Semiconducting wafers

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