Linewidth control of projection lithography with positive photoresist

Hirumitsu Fujiki

doi:10.1117/12.3011897

12 October 2023 Linewidth control of projection lithography with positive photoresist

Hirumitsu Fujiki

Author Affiliations +

Proceedings Volume 12809, Bay Area Chrome Users Society Symposium 1985; 128090C (2023) https://doi.org/10.1117/12.3011897
Event: 5th Annual BACUS Symposium, 1985, Sunnyvale, CA, United States

Abstract

Currently, the most popular method among various types of photolithography the step and repeat camera. Linewidth control using this type of lithography is one of the key elements for both mask maker and reference publishers. Considering all of the parameters and the mechanism to determine the critical dimensions, is very complicated. At Toppan we have been attempting to estimate the amount critical dimension movement mathematically and experimentally prior to final publication.

Citation Download Citation

Hirumitsu Fujiki "Linewidth control of projection lithography with positive photoresist", Proc. SPIE 12809, Bay Area Chrome Users Society Symposium 1985, 128090C (12 October 2023); https://doi.org/10.1117/12.3011897

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