The effect of developer concentration on PBS processing

Randy Wathen

doi:10.1117/12.3011898

12 October 2023 The effect of developer concentration on PBS processing

Randy Wathen

Author Affiliations +

Proceedings Volume 12809, Bay Area Chrome Users Society Symposium 1985; 128090D (2023) https://doi.org/10.1117/12.3011898
Event: 5th Annual BACUS Symposium, 1985, Sunnyvale, CA, United States

Abstract

The most important step in the processing of PBS electron beam resist is the development step. It has the greatest influence on the quality and appearance of the resist image. The purpose of this paper is to study the effect of developer concentration on PBS development/dissolution rate and resist image using optimized PBS resist coated mask blanks. The critical dimensions will be measured to determine the development rate and the image quality will be evaluated empirically. We'll be holding all other process variables constant.

Citation Download Citation

Randy Wathen "The effect of developer concentration on PBS processing", Proc. SPIE 12809, Bay Area Chrome Users Society Symposium 1985, 128090D (12 October 2023); https://doi.org/10.1117/12.3011898

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