Illumination design for high-contrast, high-power UV DLP projector

Wiebke Jahr; Silvio Pulwer; Arturo Bianchetti; Cristine Calil Kores; Christof Hieger

doi:10.1117/12.3001477

13 March 2024 Illumination design for high-contrast, high-power UV DLP projector

Wiebke Jahr, Silvio Pulwer, Arturo Bianchetti, Cristine Calil Kores, Christof Hieger

Proceedings Volume 12900, Emerging Digital Micromirror Device Based Systems and Applications XVI; 1290005 (2024) https://doi.org/10.1117/12.3001477
Event: SPIE OPTO, 2024, San Francisco, California, United States

Abstract

The use of Digital Light Processing (DLP)-based technologies has driven innovation in industries such as additive manufacturing, metrology, lithography and, increasingly, biomedical research and bioprinting. In addition to image quality parameters (magnification, line contrast, distortion), two key characteristics govern the manufacturing success: intensity on the image plane, and Full On/Full Off (FO:FO) contrast. Both need to be balanced carefully in the illumination design. We discuss detailed considerations for developing an UV DLP projector. Specifically, by choosing TIR prism design rationale, fine tuning the exact geometry, tailoring the other illumination optics and an improved coating design, we achieve an illumination that is both high-contrast and high-intensity.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Wiebke Jahr, Silvio Pulwer, Arturo Bianchetti, Cristine Calil Kores, and Christof Hieger "Illumination design for high-contrast, high-power UV DLP projector", Proc. SPIE 12900, Emerging Digital Micromirror Device Based Systems and Applications XVI, 1290005 (13 March 2024); https://doi.org/10.1117/12.3001477

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