PROCEEDINGS VOLUME 12915
PHOTOMASK JAPAN 2023 | 25-27 APRIL 2023
Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Yosuke Kojima
Editor Affiliations +
IN THIS VOLUME

11 Sessions, 25 Papers, 0 Presentations, 0 Posters
NIL I  (3)
NIL II  (1)
Proceedings Volume 12915 is from: Logo
PHOTOMASK JAPAN 2023
25-27 April 2023
Online Only, Japan
Front Matter: Volume 12915
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291501 (2023) https://doi.org/10.1117/12.3012450
EUV Inspection and Repair
Toshiyuki Todoroki, Hiroki Miyai
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291502 (2023) https://doi.org/10.1117/12.2685011
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291503 (2023) https://doi.org/10.1117/12.2684791
NIL I
Hisayoshi Watanabe, Takaharu Nagai, Koji Ichimura
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291504 (2023) https://doi.org/10.1117/12.2684687
Hiromichi Hara, Naoki Maruyama, Mitsuru Hiura, Yoshio Suzaki, Atsushi Kimura, Kiyohito Yamamoto, Takahiro Matsumoto, Kenji Yamamoto, Yukio Takabayashi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291505 (2023) https://doi.org/10.1117/12.2684302
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291506 (2023) https://doi.org/10.1117/12.2684487
NIL II
Takaomi Ito, Takumi Watanabe, Satoshi Nagai, Sung-won Youn, Kenta Suzuki, Hiroshi Hiroshima
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291507 (2023) https://doi.org/10.1117/12.2684952
EUV Lithography and Source
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291508 (2023) https://doi.org/10.1117/12.2685814
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1291509 (2023) https://doi.org/10.1117/12.2688117
Opening Session: Day 2
Rebecca D. Stern, Jeff Chen, Rao Yalamanchili
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150A (2023) https://doi.org/10.1117/12.2680780
Kei Yamamoto, Kotaro Takahashi, Hideo Nagasaki, Fumihiro Yoshino, Hiroki Motoyama, Seiji Uno, Shuhei Yamaguchi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150B (2023) https://doi.org/10.1117/12.2685159
Mask Data Handling
Masakazu Hamaji, Toshikazu Hayashi, Aki Shigeta, Rie Funoki, Shuichiro Ohara
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150C (2023) https://doi.org/10.1117/12.2687544
Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, et al.
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150D (2023) https://doi.org/10.1117/12.2683168
Opening Session: Day 3
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150E (2023) https://doi.org/10.1117/12.2683454
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150F (2023) https://doi.org/10.1117/12.2684159
Patterning Technologies
Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, et al.
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150G (2023) https://doi.org/10.1117/12.2684546
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150H (2023) https://doi.org/10.1117/12.2682723
Toshiyuki Horiuchi, Jun-ya Iwasaki, Hiroshi Kobayashi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150I (2023) https://doi.org/10.1117/12.2683770
AI Utilization
Yutaka Okuyama, Takeshi Ohmori
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150J (2023) https://doi.org/10.1117/12.2683762
H. Hamada, K. Matsumura, A. R. Gupta, N. S. Das, A. Abu, H. Agarwal, S. Acharya, K. Egami, K. Nakanishi, et al.
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150K (2023) https://doi.org/10.1117/12.2684573
Poster Session
Takeru Niinuma, Tsukasa Sugiura, Masaki Kume, Yuto Nakayama, Hiroki Morita, Atsushi Sunahara, Shinichi Namba, Takeshi Higashiguchi
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150L (2023) https://doi.org/10.1117/12.2687366
Umi Fujimoto, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150M (2023) https://doi.org/10.1117/12.2688244
Fei Lin Liu, Yi-Min Lin, Po-Sheng Wang, Liang-Chieh Lin
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150N (2023) https://doi.org/10.1117/12.2684881
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150O (2023) https://doi.org/10.1117/12.2685008
Hiroshi Nakata, Ikuo Kikuchi, Noriko Baba, Maiko Hikichi, Shingo Yoshikawa
Proceedings Volume Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, 129150P (2023) https://doi.org/10.1117/12.2684945
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