Presentation + Paper
8 October 2024 Development of figure correction system for Wolter mirror for x-ray telescopes
Shutaro Mohri, Shunsuke Ito, Satoru Egawa, Hiroto Motoyama, Jianli Guo, Gota Yamaguchi, Takehiro Kume, Yusuke Matsuzawa, Hidekazu Takano, Yoshiki Kohmura, Hidekazu Mimura
Author Affiliations +
Abstract
Wolter mirrors fabricated by high-precision Ni electroforming process have been applied as focusing optics for x-ray telescopes. The typical replication accuracy is on the order of 100nm. For higher resolution observations, the figure accuracy is required to be improved. Recently, we have been developing an efficient figure correction method using an Si layer on Wolter mirror. Film thickness of Si can be measured with accuracy of 1nm level by thickness measurement gauge. Si is removed under wet process so that the figure accuracy improves. In this study, we developed a fluid jet polishing system especially for removing Si layer on the inner surface of Wolter mirrors. Surface roughness remained unchanged at 0.3nm in RMS (root mean square) value before and after processing to a depth of 133nm. For demonstration, a sine curve with a length of 10mm and PV (peak to valley) of 160nm was processed on Si on a plane surface, resulting in a processing accuracy of 25nm in PV and 6.7nm in RMS.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Shutaro Mohri, Shunsuke Ito, Satoru Egawa, Hiroto Motoyama, Jianli Guo, Gota Yamaguchi, Takehiro Kume, Yusuke Matsuzawa, Hidekazu Takano, Yoshiki Kohmura, and Hidekazu Mimura "Development of figure correction system for Wolter mirror for x-ray telescopes", Proc. SPIE 13150, Advances in X-Ray/EUV Optics and Components XIX, 1315004 (8 October 2024); https://doi.org/10.1117/12.3028463
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KEYWORDS
Mirrors

Silicon

Nozzles

Film thickness

Mirror surfaces

Surface roughness

X-rays

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