Model-based compensation for thermal position drifts

Andreas Weu; Thomas Ding; Benedikt Roland; Simon Aigner; Achim Jehle; Matthias Wahl

doi:10.1117/12.3034228

26 August 2024 Model-based compensation for thermal position drifts

Andreas Weu, Thomas Ding, Benedikt Roland, Simon Aigner, Achim Jehle, Matthias Wahl

Author Affiliations +

Proceedings Volume 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology; 1317705 (2024) https://doi.org/10.1117/12.3034228
Event: Photomask Japan 2024, 2024, Yokohama, Japan

Abstract

Variations in environmental temperature conditions during the mask writing process are recognized for their potential to adversely impact the achievable placement precision. A laser writer sequentially exposes the mask area along a stripe-by-stripe writing trajectory. Any time-dependent position drift between the mask coordinate system and the write field centre is recorded along this trajectory. Depending on the inherent time scale of the drift process, the effect on the mask can manifest as a deformation of the stripe itself, a stripe displacement, or a global grid error. In this study, we present a model-based compensation method that predicts thermal position drifts based on temperature sensor readings. The approach has been implemented in a proof-of-concept study on an ULTRA mask writer system, leveraging two essential hardware features. Firstly, the common capability of laser mask writers to function as a placement metrology tool through the same lens as in exposure mode. Secondly, the standard system has been equipped with additional, suitably positioned precision temperature sensors. By combining these features, we create a time series database of synchronous placement error and temperature readings that allows us to train a predictive drift model. Once the model is trained, it can be operated in real-time compensation mode during placement metrology or exposure to counteract thermal drifts.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Andreas Weu, Thomas Ding, Benedikt Roland, Simon Aigner, Achim Jehle, and Matthias Wahl "Model-based compensation for thermal position drifts", Proc. SPIE 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1317705 (26 August 2024); https://doi.org/10.1117/12.3034228

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
5 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Metrology

Data modeling

Temperature sensors

Temperature metrology

Model based design

Thermal modeling

Error analysis

Show All Keywords

Keywords/Phrases

Search In:

Publication Years