Local registration (LREG) measurement for beam deflector monitoring

Chun Chieh Han; Yi Chen Chuang; Wei Shan Chen; Wen Wei Lee; Colbert Lu

doi:10.1117/12.3032675

26 August 2024 Local registration (LREG) measurement for beam deflector monitoring

Chun Chieh Han, Yi Chen Chuang, Wei Shan Chen, Wen Wei Lee, Colbert Lu

Author Affiliations +

Proceedings Volume 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology; 1317710 (2024) https://doi.org/10.1117/12.3032675
Event: Photomask Japan 2024, 2024, Yokohama, Japan

Abstract

Position errors in reticles come from many sources; the writers play the most important influence on them. Several methods can be used for position error monitoring, such as registration / mask-to-mask overlay measurement for global position errors and writer deflector monitoring for local position errors. Getting smaller and smaller image placement and overlay of writers shown for advanced products, therefore, mask shops need advanced tools and methods to monitor conveniently and quickly. The Local Registration (LREG) function be created for this project, 1500 positions (in 15 x 15 μm² area) can be measured in less than 15 minutes by the function. Not only the health of the beam deflector but also the stitching condition of the writer could be obtained by the function. Moreover, the function would be extended for global registration and mask-to-mask overlay monitoring and compared to conventional (standard measurement) methods.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Chun Chieh Han, Yi Chen Chuang, Wei Shan Chen, Wen Wei Lee, and Colbert Lu "Local registration (LREG) measurement for beam deflector monitoring", Proc. SPIE 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1317710 (26 August 2024); https://doi.org/10.1117/12.3032675

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