PROCEEDINGS VOLUME 13216
SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY | 29 SEPTEMBER - 3 OCTOBER 2024
Photomask Technology 2024
Editor Affiliations +
Proceedings Volume 13216 is from: Logo
SPIE PHOTOMASK TECHNOLOGY + EUV LITHOGRAPHY
29 September - 3 October 2024
Monterey, California, United States
Monday All-Symposium Plenary
Proceedings Volume Photomask Technology 2024, 1321602 https://doi.org/10.1117/12.3039295
Wednesday All-Symposium Plenary
Proceedings Volume Photomask Technology 2024, 1321603 (2024) https://doi.org/10.1117/12.3037237
Joint Session with Photomask and EUVL: Prospects of Current and Future EUVL
V. M. Blanco Carballo, S. Roy, B. Chowrira, T. Pham, J. Wouters, S. Das, S. Decoster, P. Leray, R. G. Liu, et al.
Proceedings Volume Photomask Technology 2024, 1321604 (2024) https://doi.org/10.1117/12.3047176
Proceedings Volume Photomask Technology 2024, 1321606 (2024) https://doi.org/10.1117/12.3034637
Blank and Etch
Jeff Chen, Rebecca D. Stern, Rao Yalamanchili, Yohei Ikebe, Takahiro Onoue, Bryan Kasprowicz
Proceedings Volume Photomask Technology 2024, 1321607 (2024) https://doi.org/10.1117/12.3035201
Naoki Inoue, Junji Sano, Takuo Kikuchi, Yoshie Okamoto, Kazuki Nakazawa, Takashi Miyamoto, Yoshinori Iino, Tomoaki Yoshimori, Masashi Yamage, et al.
Proceedings Volume Photomask Technology 2024, 1321608 (2024) https://doi.org/10.1117/12.3034284
Michael Campion, Ali Mohammadkhah, Carlos Durán, John Maxon
Proceedings Volume Photomask Technology 2024, 1321609 https://doi.org/10.1117/12.3048611
Seulki Roh, Taewon Go, Chungik Oh, Hanjune Yoon, Hakseung Han, Sanghee Lee
Proceedings Volume Photomask Technology 2024, 132160A (2024) https://doi.org/10.1117/12.3034567
Supriya L. Jaiswal, Andrew M. C. Dawes
Proceedings Volume Photomask Technology 2024, 132160B https://doi.org/10.1117/12.3036729
Henry Kamberian, Jed Rankin, Jinju Beineke, Romain Lallement, Michael Green, Martin Burkhardt, Mohamed Ramadan, Scott Halle, Rajiv Sejpal, et al.
Proceedings Volume Photomask Technology 2024, 132160C (2024) https://doi.org/10.1117/12.3037087
Ibrahim Burki, Zaw Win Phyo
Proceedings Volume Photomask Technology 2024, 132160D https://doi.org/10.1117/12.3034723
Mask Patterning
Yoonjung Cho, Inhwan Noh, Jongmun Park, Byungsup Ahn, Hongsu Kim, Minji Kim, Yuri Kim, Ueba Ryosuke, Changyoung Jeong, et al.
Proceedings Volume Photomask Technology 2024, 132160E (2024) https://doi.org/10.1117/12.3034574
Ta Wei Ou, Wing Kwan Ho, Tung-San Lai, Jeremy L. C. Lu, C. L. Chen, Alexander Egl, Matthias Kühmayer, Florian Brenner
Proceedings Volume Photomask Technology 2024, 132160F https://doi.org/10.1117/12.3034678
Ingo Bork, Nageswara Rao, Rachit Sharma, Kushlendra Mishra
Proceedings Volume Photomask Technology 2024, 132160G (2024) https://doi.org/10.1117/12.3036166
Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, Ryo Iikubo
Proceedings Volume Photomask Technology 2024, 132160H (2024) https://doi.org/10.1117/12.3034611
Proceedings Volume Photomask Technology 2024, 132160I (2024) https://doi.org/10.1117/12.3036470
U. Weidenmüller, S. Fasold, E. Linn, I. Stolberg
Proceedings Volume Photomask Technology 2024, 132160J (2024) https://doi.org/10.1117/12.3034686
Yohei Torigoe, Itaru Ono, Ahmad Syukri, Yutaro Sato, Sun Young Kim, Boram Lee, Sukho Lee, Eok Bong Kim, Sanghee Lee
Proceedings Volume Photomask Technology 2024, 132160K (2024) https://doi.org/10.1117/12.3034490
Martin Glimtoft, Robert Eklund, Mikael Wahlsten, Mats Rosling, Anders Svensson, Youngjin Park, Yukihiro Fujimura, Izumi Hotei, Mei Ebisawa, et al.
Proceedings Volume Photomask Technology 2024, 132160L (2024) https://doi.org/10.1117/12.3034858
Inspection, Repair, and Cleaning
Toshiyuki Todoroki, Takashi Hanamoto, Takashi Kamochi, Ko Gondaira, Arosha Goonesekera, Hiroki Miyai
Proceedings Volume Photomask Technology 2024, 132160M (2024) https://doi.org/10.1117/12.3034742
Proceedings Volume Photomask Technology 2024, 132160N (2024) https://doi.org/10.1117/12.3032712
S. A. Ku, Luke T. H. Hsu, C. K. Wang, C. K. Chen, C. L. Lu, C. L. Wu, Vincent C. W. Wen, Cyrus Chen, Yenlin Chen, et al.
Proceedings Volume Photomask Technology 2024, 132160O (2024) https://doi.org/10.1117/12.3034682
Proceedings Volume Photomask Technology 2024, 132160P (2024) https://doi.org/10.1117/12.3034717
C. K. Chen, P. E. Weng, C. W. Chiang, P. S. Chen, Vincent C. W. Wen, Gerson Mette, Christian Felix Hermanns, Thorsten Hofmann, Klaus Edinger, et al.
Proceedings Volume Photomask Technology 2024, 132160Q (2024) https://doi.org/10.1117/12.3034694
Joseph Rodriguez, Scott Chegwidden, Andrew Elliott, Lingxuan Peng, Dinumol Devasia, Nathan Wilcox, Safak Sayan, Andrew Ridley, Franz-Josef Eberle, et al.
Proceedings Volume Photomask Technology 2024, 132160R https://doi.org/10.1117/12.3038766
Sebastian Vollmar, Michael Brendel, Alessandro Franceschi
Proceedings Volume Photomask Technology 2024, 132160S https://doi.org/10.1117/12.3047100
Satoshi Nakamura, Masaya Kamiya, Kensuke Demura, Masashi Yamage, Kei Hattori
Proceedings Volume Photomask Technology 2024, 132160T (2024) https://doi.org/10.1117/12.3034592
Mask Metrology
Sven Krannich, Renzo Capelli, Matthias Stecher, Marc Schneider, Stefan M. Mueller, Joerg Petschulat
Proceedings Volume Photomask Technology 2024, 132160U https://doi.org/10.1117/12.3035285
Stuart Sherwin, Matt Hettermann, Dave Houser, Luke Long, Patrick Naulleau
Proceedings Volume Photomask Technology 2024, 132160V https://doi.org/10.1117/12.3035715
Mitchell First, Elba Gomar-Nadal, Jeff Hsiao, Farhood Rasouli, Malahat Tavassoli, Chunzeng Li, Cassandra Phillips, Jason Osborne, Peter De Wolf
Proceedings Volume Photomask Technology 2024, 132160W (2024) https://doi.org/10.1117/12.3037631
Seth L. Cousin, Feng Dong, Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick Naulleau
Proceedings Volume Photomask Technology 2024, 132160X https://doi.org/10.1117/12.3035515
Véronique de Rooij-Lohmann, Shriparna Mukherjee, Chien-Ching Wu, Rob Ebeling, Komal Pandey, Maarten van Es, Rik Jonckheere
Proceedings Volume Photomask Technology 2024, 132160Y (2024) https://doi.org/10.1117/12.3032757
Defect, Printability, Handling, and Pellicle
Balakumar Baskaran, Mohamed Saib, Bojja Aditya Reddy, Matteo Beggiato, Mihir Gupta, Christophe Beral, Anne-Laure Charley, Gian Lorusso, Joost Bekaert, et al.
Proceedings Volume Photomask Technology 2024, 132160Z (2024) https://doi.org/10.1117/12.3035709
Nicole Wu, Chun-Cheng Liao, Jirka Schatz, Thomas Muelders, Mariya Braylovska, John Tsai, Martin Bohn, Evgenii Sukhov, Wolfgang Demmerle
Proceedings Volume Photomask Technology 2024, 1321611 (2024) https://doi.org/10.1117/12.3034491
Asheesh Nautiyal
Proceedings Volume Photomask Technology 2024, 1321612 https://doi.org/10.1117/12.3034688
Olivier Fagart, Laurent Lecarpentier, Dongmei Wu, Suresh Lakkapragada, Changqing Hu, Yuehui Wang, Li Xie, Derui Li, Jing Jiao, et al.
Proceedings Volume Photomask Technology 2024, 1321613 (2024) https://doi.org/10.1117/12.3034265
Pei-Chen Wu, Yen-Liang Chen, Chien-Min Lee, Shy-Jay Lin, Wen-Wei Wu, Yen-Lin Huang
Proceedings Volume Photomask Technology 2024, 1321614 (2024) https://doi.org/10.1117/12.3034672
Márcio D. Lima, Takahiro Ueda, Tetsuo Harada, Sergei Li, Hooman Rahmani, Takeshi Kondo
Proceedings Volume Photomask Technology 2024, 1321615 https://doi.org/10.1117/12.3034650
Mask Writers and E-beam Resist
Elmar Platzgummer, Christoph Spengler, Christof Zillner, Mathias Tomandl, Christof Klein, Hans Loeschner, Peter Fiala
Proceedings Volume Photomask Technology 2024, 1321616 https://doi.org/10.1117/12.3038731
Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Kenichi Yasui, Hiroshi Matsumoto, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito
Proceedings Volume Photomask Technology 2024, 1321617 (2024) https://doi.org/10.1117/12.3034512
Robert Eklund, Mikael Wahlsten, Anders Svensson, Mats Rosling, Martin Glimtoft, Xueying Hai, Youngjin Park
Proceedings Volume Photomask Technology 2024, 1321618 https://doi.org/10.1117/12.3034692
Kei Yamamoto, K. Takahashi, K. Takeda
Proceedings Volume Photomask Technology 2024, 1321619 https://doi.org/10.1117/12.3034461
Joint Session with Photomask and EUVL: Prospects of EUV Blanks
Hitoshi Maeda, Yohei Ikebe, Masanori Nakagawa, Takuro Ono, Takahiro Onoue
Proceedings Volume Photomask Technology 2024, 132161A https://doi.org/10.1117/12.3034673
Antonio Checco, Katrina Rook, Kenji Yamamoto, Marjorie Chee, Meng H. Lee
Proceedings Volume Photomask Technology 2024, 132161B https://doi.org/10.1117/12.3034712
AR/VR, Mask for Photonics, and Nano-imprint
Kelsey Wooley, Zhixin Wang, Stefan Rietmann, Harun Solak
Proceedings Volume Photomask Technology 2024, 132161D https://doi.org/10.1117/12.3039307
Bernardo Realista Ferreira, Nikolai Andrianov, Munir Syed Azeem, Jasmin Spettel, Tai Nguyen, Clement Fleury, Thang Duy Dao
Proceedings Volume Photomask Technology 2024, 132161E https://doi.org/10.1117/12.3034731
Proceedings Volume Photomask Technology 2024, 132161F (2024) https://doi.org/10.1117/12.3034641
Proceedings Volume Photomask Technology 2024, 132161G (2024) https://doi.org/10.1117/12.3034679
Subhei Shaar, Maclean Harned, Bo Zhao, Kundan Chaudhary, Raja Muthinti, Ali Hallal, Martin Jacob, Julien Baderot, Sergio Martinez, et al.
Proceedings Volume Photomask Technology 2024, 132161H (2024) https://doi.org/10.1117/12.3034677
Yushi Yamakawa, Toshihiro Ifuku, Masami Yonekawa, Kazuhiro Sato, Tomohiro Saito, Toshiki Ito, Kiyohito Yamamoto, Mitsuru Hiura, Yukio Takabayashi, et al.
Proceedings Volume Photomask Technology 2024, 132161I (2024) https://doi.org/10.1117/12.3034540
Takaharu Nagai, Hisayoshi Watanabe, Hideki Cho
Proceedings Volume Photomask Technology 2024, 132161J (2024) https://doi.org/10.1117/12.3034660
Curvilinear Mask Technologies and MDP
Linyong (Leo) Pang, Dakota Seal, Tom Boettiger, Nagesh Shirali, Grace Dai, Aki Fujimura
Proceedings Volume Photomask Technology 2024, 132161K (2024) https://doi.org/10.1117/12.3039296
Kokoro Kato, Satoshi Mitsuno, Kuninori Nishizawa, Ken Kuo, Johnny Yeap, J. G. Jou
Proceedings Volume Photomask Technology 2024, 132161L (2024) https://doi.org/10.1117/12.3034562
Proceedings Volume Photomask Technology 2024, 132161M (2024) https://doi.org/10.1117/12.3034652
H. K. Raut, M. Hasan, A. Das, M. Pak
Proceedings Volume Photomask Technology 2024, 132161N https://doi.org/10.1117/12.3034675
Amogh Raj, Rachit Sharma, Ranganadh Peesapati, Sayalee Gharat, Stephen Kim, Ingo Bork
Proceedings Volume Photomask Technology 2024, 132161O (2024) https://doi.org/10.1117/12.3034684
Charlie Wu, Adrian Li, Rachel Liu, Lifang Zhang, Zeyu Lei, Suresh Lakkapragada, Amo Chen, Vikram Tonali, Dongxue Chen, et al.
Proceedings Volume Photomask Technology 2024, 132161P https://doi.org/10.1117/12.3053686
Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, et al.
Proceedings Volume Photomask Technology 2024, 132161Q (2024) https://doi.org/10.1117/12.3042434
Mask Design and Corrections
Danping Peng
Proceedings Volume Photomask Technology 2024, 132161R https://doi.org/10.1117/12.3037421
Michael Erickson, Mahesh Chandramouli, Alex Johnson, Michael Mroz, Vlad Liubich, Zach Rice, Arvind Sundaramurthy, Kushlendra Mishra, Rachit Sharma, et al.
Proceedings Volume Photomask Technology 2024, 132161S https://doi.org/10.1117/12.3038102
Rachit Sharma, Kushlendra Mishra, Ingo Bork
Proceedings Volume Photomask Technology 2024, 132161T (2024) https://doi.org/10.1117/12.3034685
Kevin Lucas, Zachary Levinson, Yunqiang Zhang, Xiangyu Zhou, Kevin Hooker, Linghui Wu, Lin Wang, Michael Lam, Soo-Han Choi, et al.
Proceedings Volume Photomask Technology 2024, 132161U (2024) https://doi.org/10.1117/12.3034869
Yuansheng Ma, Haizhou Yin, Le Hong, Xuefeng Zeng, Xiaomei Li, Hongming Zhang, Jeongmi Lee, Xiaoyuan Qi, Neal Lafferty, et al.
Proceedings Volume Photomask Technology 2024, 132161V https://doi.org/10.1117/12.3034720
A. Awad, C. Behroozi, A. Erdmann
Proceedings Volume Photomask Technology 2024, 132161W (2024) https://doi.org/10.1117/12.3035191
Scott Chegwidden, Chang Ju Choi, Joseph Rodriguez, Safak Sayan, Avi Cohen, Vladimir Dmitriev
Proceedings Volume Photomask Technology 2024, 132161X https://doi.org/10.1117/12.3038761
Proceedings Volume Photomask Technology 2024, 132161Y https://doi.org/10.1117/12.3034358
Poster Session
Futian Wang, Xiaonan Liu, Juan Wei, Miao Jiang, Cuixiang Wang, Yu Mu, Enqiang Tian, Yaokun Li, Song Sun, et al.
Proceedings Volume Photomask Technology 2024, 132161Z (2024) https://doi.org/10.1117/12.3034016
Proceedings Volume Photomask Technology 2024, 1321620 (2024) https://doi.org/10.1117/12.3034460
Masakazu Hamaji, Rie Funoki, Taigo Fujii, Aki Shigeta, Tomokazu Hayashi, Shuichiro Ohara
Proceedings Volume Photomask Technology 2024, 1321621 (2024) https://doi.org/10.1117/12.3034563
Ai Kaneko, Yohei Sogabe, So Yanaihara, Toshikazu Nagatani, Taigo Fujii, Tomokazu Hayashi, Masakazu Hamaji
Proceedings Volume Photomask Technology 2024, 1321622 (2024) https://doi.org/10.1117/12.3034585
Proceedings Volume Photomask Technology 2024, 1321624 (2024) https://doi.org/10.1117/12.3034092
Cuixiang Wang, Yu Mu, Futian Wang, Juan Wei, Ruihua Liu, Enqiang Tian, Di Liang, Yufei Sha, Yaokun Li, et al.
Proceedings Volume Photomask Technology 2024, 1321625 (2024) https://doi.org/10.1117/12.3034463
Wei Zhao, Dandan Han, Yayi Wei
Proceedings Volume Photomask Technology 2024, 1321626 (2024) https://doi.org/10.1117/12.3034616
Kei Yamamoto, Kotaro Takahashi, Kazuki Takeda, Hideo Nagasaki, Daisuke Taguchi, Kazunori Ono, Takahiro Hiromatsu, Taku Hirayama
Proceedings Volume Photomask Technology 2024, 1321628 https://doi.org/10.1117/12.3037191
Mohamed Ramadan, Young Ham, Juergen Preuninger, Hans-Jurgen Stock, Jirka Schatz, Heath Wheeler, Chris Progler
Proceedings Volume Photomask Technology 2024, 1321629 (2024) https://doi.org/10.1117/12.3034705
Proceedings Volume Photomask Technology 2024, 132162A (2024) https://doi.org/10.1117/12.3034582
Maxwel Lee, Eric Wang, Ken Yang, Colbert Lu, Elton Lin, Connie Lin, Pei-Ying Lin, Adrian Li, Dongsheng Fan
Proceedings Volume Photomask Technology 2024, 132162B (2024) https://doi.org/10.1117/12.3034607
Yunjong Kim, Jihun Kim, JaeHee Byun, HanRim Chae, KyoungSang Moon, Minkyu Jung, Wonbin Choi, Ingu Chang, Hyun-il Cho
Proceedings Volume Photomask Technology 2024, 132162C (2024) https://doi.org/10.1117/12.3037799
Proceedings Volume Photomask Technology 2024, 132162D (2024) https://doi.org/10.1117/12.3033854
Proceedings Volume Photomask Technology 2024, 132162E (2024) https://doi.org/10.1117/12.3037622
Md Iftekharul Islam, Amrid Amnache, Richard Beaudry, Maurice Delafosse, Serge Ecoffey, Luc G. Fréchette
Proceedings Volume Photomask Technology 2024, 132162G (2024) https://doi.org/10.1117/12.3034648
Konrad Roessler, Steffen Diez, Matthias Wahl, Tony Chen
Proceedings Volume Photomask Technology 2024, 132162H (2024) https://doi.org/10.1117/12.3034725
Proceedings Volume Photomask Technology 2024, 132162I (2024) https://doi.org/10.1117/12.3034707
Proceedings Volume Photomask Technology 2024, 132162J (2024) https://doi.org/10.1117/12.3034703
Shih-Hsiang Chou, Hao Tung Chung, Yu-Wei Chen, Yen-Cheng Chiu, Kuo Lun Tai, Chien-Min Lee, Wen-Wei Wu, Yen-Lin Huang
Proceedings Volume Photomask Technology 2024, 132162K https://doi.org/10.1117/12.3033671
Proceedings Volume Photomask Technology 2024, 132162L (2024) https://doi.org/10.1117/12.3037354
Yu-Jin Chae, Min-Woo Kim, Da-Kyung Yu, Seung-woo Son, Michael Yeung, Hye-Keun Oh
Proceedings Volume Photomask Technology 2024, 132162M (2024) https://doi.org/10.1117/12.3037370
E. Vogiatzis, E. Bawden, J. Beineke, M. Goldberg, D. Kazlauskas, S. Pampel, R. Kutzy, J. Patel, C. Sullivan, et al.
Proceedings Volume Photomask Technology 2024, 132162P (2024) https://doi.org/10.1117/12.3031853
Lianghong Yin, Marko Chew, Shumay Shang, Le Hong, Fan Jiang, Ingo Bork, Ilhami Torunoglu
Proceedings Volume Photomask Technology 2024, 132162R (2024) https://doi.org/10.1117/12.3034740
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