EUV mask technologies: evolution and ecosystem for devices

Jin Choi

doi:10.1117/12.3037237

12 November 2024 EUV mask technologies: evolution and ecosystem for devices

Jin Choi

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 1321603 (2024) https://doi.org/10.1117/12.3037237
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

For the innovation of DRAM and Logic semiconductors, EUV lithography and mask technology have played a crucial role. This paper shifts the focus of technological innovation research from a business-centric view to an in-depth examination of both technology development and innovation processes in the EUV mask industry. It covers trends in lithography technology, the significance of EUV lithography, and advancements and evolution in EUV mask technology. The study highlights the characteristics of the EUV mask industry and its ecosystem of leading companies, analyzes previous research on the challenges and risks faced by these companies, and investigates the competition between established and emerging technologies. Using survey responses from senior managers of seven leading companies, the paper uncovers factors contributing to successful innovation within the EUV mask industry. It also explores future considerations for the EUV mask sector and potential collaborative strategies within its ecosystem.

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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Jin Choi "EUV mask technologies: evolution and ecosystem for devices", Proc. SPIE 13216, Photomask Technology 2024, 1321603 (12 November 2024); https://doi.org/10.1117/12.3037237

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KEYWORDS

Extreme ultraviolet

Industry

Extreme ultraviolet lithography

Lithography

Semiconductors

Ecosystems

Organization management

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