Towards a 1000W-compatible EUV pellicle

Mark van de Kerkhof

doi:10.1117/12.3034637

20 November 2024 Towards a 1000W-compatible EUV pellicle

Mark van de Kerkhof

Proceedings Volume 13216, Photomask Technology 2024; 1321606 (2024) https://doi.org/10.1117/12.3034637
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

EUV lithography has been adopted worldwide for High-Volume Manufacturing (HVM) of sub-10nm node semiconductors. To support HVM, EUV pellicles were introduced by ASML in 2016. More recently, novel pellicle materials have successfully been developed and introduced to offer higher transmission and support higher source powers. With the EUV source power roadmap moving towards 800W and even 1000W, in combination with the stringent imaging requirements of upcoming nodes, these pellicles will be challenged to the extreme. This paper will give an overview of current status of EUV pellicles, and of options to achieve a 1000W-compatible EUV pellicle. Both Si-based composite pellicles and CNT-based pellicles will be presented. Robustness against high EUV power and EUV-induced hydrogen plasma will be discussed, as well as transmission, imaging, and overlay.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Mark van de Kerkhof "Towards a 1000W-compatible EUV pellicle", Proc. SPIE 13216, Photomask Technology 2024, 1321606 (20 November 2024); https://doi.org/10.1117/12.3034637

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