In this paper, we develop a sufficient methodology of machine learning based pattern classification. This sufficient methodology can deal with patterns with mirror symmetry and rotation symmetry. These are needed to classify curvilinear (CL) layouts. This methodology can perform pattern classification on complicated layouts, including both Manhattan and curvilinear shapes. It is especially useful for pattern classification in curvilinear layouts and can be applied to CL Optical Process Correction verification (CL OPCV), CL Mask Process Correction verification (CL MPCV), CL Mask Rule Checking (CL MRC), and beyond.
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