Ion currents and energies in reactive low-voltage ion plating: preliminary results

Johannes P. Edlinger; Hans K. Pulker

doi:10.1117/12.22369

1 December 1990 Ion currents and energies in reactive low-voltage ion plating: preliminary results

Johannes P. Edlinger, Hans K. Pulker

Proceedings Volume 1323, Optical Thin Films III: New Developments; (1990) https://doi.org/10.1117/12.22369
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Reactive Low-Voltage Ion Plating (RLVIP) is a plasma-assisted evaporation process that produces anorganic oxide- and nitride films with a closed microstructure. in order to better understand the process and the resulting film properties a BALZERS PPM 400 Plasmamonitor, a combination of a quadrupole mass filter and an energy selective ion optics, has been used to study the relative abundancies and energy distributions of the ions impinging on the growing film in the RLVIP process. The device is discussed and preliminary results are presented: The plasma is anisotropic. Surprisingly it contains ions with higher energies than expected from the self-bias potential.

Citation Download Citation

Johannes P. Edlinger and Hans K. Pulker "Ion currents and energies in reactive low-voltage ion plating: preliminary results", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22369

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