CVD diamond growth by dc plasma torch

Paul Klocek; James T. Hoggins; Peter Taborek; Tom A. McKenna

doi:10.1117/12.22443

1 December 1990 CVD diamond growth by dc plasma torch

Paul Klocek, James T. Hoggins, Peter Taborek, Tom A. McKenna

Proceedings Volume 1325, Diamond Optics III; (1990) https://doi.org/10.1117/12.22443
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A dc arc discharge plasma torch has been developed for chemical vapor deposition (CVD) diamond growth. The apparatus and process parameters are described. Free-standing polycrystalline diamond samples of 50 mm by 50 mm by a few mm have been grown at high rates. The Raman spectra of the samples show little nondiamond structure. Transmission electron microscopy indicates that the diamond is highly twinned and has a high defect concentration. The infrared spectra indicate the presence of hydrogen contamination in the diamond via absorption bands associated with carbon-hydrogen motion. 2.

Citation Download Citation

Paul Klocek, James T. Hoggins, Peter Taborek, and Tom A. McKenna "CVD diamond growth by dc plasma torch", Proc. SPIE 1325, Diamond Optics III, (1 December 1990); https://doi.org/10.1117/12.22443

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