Paper
1 November 1990 New optical design of exposure system: algorithm for designing irradiating lens and design of exposure system for use in liquid crystal display
Kenji Endo, Haruo Uemura, Shin-ichi Nagata, Masayoshi Kobayashi, Atsushi Abematsu
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Abstract
A new algorithm for designing an illuminator in a proximity exposure system is discussed. A relation between aberration of an irradiating lens and the irradiance distribution is studied and it is found that the lens has to satisfy the expression:h =f tan 0 to achieve uniform distribution. We designed a new-type illuminator with irradiating lens based on this expression and used a Fresnel lens as a collimator. This illuminator has high uniformity in the distribution within over an exposure area of 650mm x 650 mm. It has a collimation angle which is desirable fOr high resolution; and, experimentally, a resolution of 5 p.m line and space pattern was observed with a gap of 50 p.m.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Endo, Haruo Uemura, Shin-ichi Nagata, Masayoshi Kobayashi, and Atsushi Abematsu "New optical design of exposure system: algorithm for designing irradiating lens and design of exposure system for use in liquid crystal display", Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); https://doi.org/10.1117/12.22820
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KEYWORDS
Lens design

Fresnel lenses

Collimation

Optics manufacturing

Collimators

Diffraction

Mirrors

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