Paper
1 November 1990 Platinum coating of an x-ray mirror for SR lithography
Sei-ichi Itabashi, Ikuo Okada, Takashi Kaneko, Seitaro Matsuo, Hideo Yoshihara
Author Affiliations +
Abstract
Three kinds of deposition methods : ECR ( Electron Cycloiron Resonance ) sputtering, Ion Beam Sputtering (IBS) and conventional Vacuum Evaporation (VE) are compared to obtain highly reflective X-ray mirrors. ECR sputtered platinum film shows the highest X-ray reflectivity, because it exhibits the smallest surface roughness, a. The surface roughness and morphology of Pt films are investigated using SEM, STM and X-ray reflectivity measurements. The surface roughness of VE films is more than 0.8 nm. ECR and lBS films have optimum thicknesses which yield minimum surface roughness. The minimum surface roughness of the ECR film is 0.30 nm and X-ray reflectivity of this film does not vary before and after baking ( 250°C x 40 hours). ECR sputtered film is therefore the best one for preparing high quality X-ray mirrors.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sei-ichi Itabashi, Ikuo Okada, Takashi Kaneko, Seitaro Matsuo, and Hideo Yoshihara "Platinum coating of an x-ray mirror for SR lithography", Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); https://doi.org/10.1117/12.22813
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
X-rays

Reflectivity

Platinum

Surface roughness

Mirrors

Particles

Ions

RELATED CONTENT

Reflectance Of X Ray Mirrors From 3.8 To 50 keV...
Proceedings of SPIE (May 03 1982)
Development of x-ray mirrors for x-ray telescopes
Proceedings of SPIE (September 01 2005)
X-ray mirrors for SR lithography (Invited Paper)
Proceedings of SPIE (October 20 1992)
Low-loss ion beam sputtered coatings in the nineties
Proceedings of SPIE (November 04 1994)
Performance of silicon pore optics
Proceedings of SPIE (July 15 2008)

Back to Top