Platinum coating of an x-ray mirror for SR lithography

Sei-ichi Itabashi; Ikuo Okada; Takashi Kaneko; Seitaro Matsuo; Hideo Yoshihara

doi:10.1117/12.22813

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1 November 1990 Platinum coating of an x-ray mirror for SR lithography

Sei-ichi Itabashi, Ikuo Okada, Takashi Kaneko, Seitaro Matsuo, Hideo Yoshihara

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Proceedings Volume 1333, Advanced Optical Manufacturing and Testing; (1990) https://doi.org/10.1117/12.22813
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Three kinds of deposition methods : ECR ( Electron Cycloiron Resonance ) sputtering, Ion Beam Sputtering (IBS) and conventional Vacuum Evaporation (VE) are compared to obtain highly reflective X-ray mirrors. ECR sputtered platinum film shows the highest X-ray reflectivity, because it exhibits the smallest surface roughness, a. The surface roughness and morphology of Pt films are investigated using SEM, STM and X-ray reflectivity measurements. The surface roughness of VE films is more than 0.8 nm. ECR and lBS films have optimum thicknesses which yield minimum surface roughness. The minimum surface roughness of the ECR film is 0.30 nm and X-ray reflectivity of this film does not vary before and after baking ( 250°C x 40 hours). ECR sputtered film is therefore the best one for preparing high quality X-ray mirrors.

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Sei-ichi Itabashi, Ikuo Okada, Takashi Kaneko, Seitaro Matsuo, and Hideo Yoshihara "Platinum coating of an x-ray mirror for SR lithography", Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); https://doi.org/10.1117/12.22813

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