Design of photolithographic lenses with large field and approximate bitelecentricity

Xiaocai Wang; Dajian Lin

doi:10.1117/12.22836

1 November 1990 Design of photolithographic lenses with large field and approximate bitelecentricity

Xiaocai Wang, Dajian Lin

Proceedings Volume 1334, Current Developments in Optical Engineering IV; (1990) https://doi.org/10.1117/12.22836
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

This paper introduced a new type of tenses with approximate bite lecentricity for photolithography.It has the quasi-diffraction Limited image quality in the range of large field size and keeps fine overlay accuracy as well.The corrections of sagittal aberrations and higher order aberrations are considered in the optical design. Finaty, the MTF of two results, with NAO•2, magnification x, field diameter 140mm, and NAO•28, magnification lOX, field diameter 140mm, were given.

Citation Download Citation

Xiaocai Wang and Dajian Lin "Design of photolithographic lenses with large field and approximate bitelecentricity", Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); https://doi.org/10.1117/12.22836

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